0372-400Х (Edition in Ukrainian)
2071-0186 (Edition in English)
2071-0194 (in electronic form)
Abbreviated key title: Ukr. J. Phys.
Gavrylyuk O.O.1, Semchuk O.Yu.1, Steblova O.V.2, Evtukh A.A.2, Fedorenko L.L.2
1 Chuiko Institute of Surface Chemistry, Nat. Acad. of Sci. of Ukraine
(17, General Naumov Str., Kyiv 03164, Ukraine; e-mail: firstname.lastname@example.org)
2 V. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
(41, Nauky Ave., Kyiv 03028, Ukraine)
Study of the Distribution of Temperature Profiles in Nonstoichiometric SiOx Films at Laser Annealing
Section: Solid matter
Original Author's Text: English
Abstract: The distribution of temperature profiles in nonstoichiometric SiOx films at the single pulse laser annealing has been studied theoretically. Temperature distributions on the surface of the SiOx films at irradiation by a laser beam with various intensities have been calculated. Temperature distributions on various depths of the SiOx films at irradiation by a laser beam with an intensity of 52 МW/cm2 have been found. During the laser pulse of 10 ns with an intensity of 52 MW/cm2 , the temperature up to 1800 K can be reached on the specimen surface.
Key words: SiOx films, thermal conductivity, nanocrystals.