• Українська
  • English

< | >

Current issue   Ukr. J. Phys. 2014, Vol. 58, N 2, p.116-121
doi:10.15407/ujpe58.02.0116    Paper

General A.A., Shpenik Yu.O.

Institute of Electron Physics, Nat. Acad. of Sci. of Ukraine
(21, Universytets’ka Str., Uzhgorod 88017, Ukraine; e-mail: heneral-andrij@rambler.ru)

Modeling of Gas Discharge in Water Vapor.

Section: Optics, lasers, and quantum electronics
Original Author's Text: Ukrainian

Abstract: The results of our study of a gas-discharge plasma in water vapor are reported. The generation rate of excited OH* (A2Σ+) radicals in the water vapor discharge turns out significantly higher than the formation rate of emitting states of hydrogen and oxygen atoms. According to our estimations, the optimum value of E/N-ratio between the electric field strength E and the concentration of gas particles N for the excitation of radical OH* bands equals (300 ÷ 400)×10−21 V · m2.

Key words: gas discharge, radical, rate constant.