0372-400Х (Edition in Ukrainian)
2071-0186 (Edition in English)
2071-0194 (in electronic form)
Abbreviated key title: Ukr. J. Phys.
General A.A., Shpenik Yu.O.
Institute of Electron Physics, Nat. Acad. of Sci. of Ukraine
(21, Universytets’ka Str., Uzhgorod 88017, Ukraine; e-mail: email@example.com)
Modeling of Gas Discharge in Water Vapor.
Section: Optics, lasers, and quantum electronics
Original Author's Text: Ukrainian
Abstract: The results of our study of a gas-discharge plasma in water vapor are reported. The generation rate of excited OH* (A2Σ+) radicals in the water vapor discharge turns out significantly higher than the formation rate of emitting states of hydrogen and oxygen atoms. According to our estimations, the optimum value of E/N-ratio between the electric field strength E and the concentration of gas particles N for the excitation of radical OH* bands equals (300 ÷ 400)×10−21 V · m2.
Key words: gas discharge, radical, rate constant.